E-beam Evaporator – Unaxis BAK 640

Unaxis
Operative
Marco Asa, Elisa Sogne
Authorized user
Thin Films Deposition

Description:

The E-beam BAK 640 evaporator is equipped with a 6 pocket rotating crucible. At the moment the equipment has the following processes available: Ag, Al, Al2O3, Au, C, Cr, Cu, Fe, Ge, HfO2, Ni, Permalloy (NiFe), Pt, Si, SiO, SiO2,Sn, Ta, Ti, TiN, TiO2, ZnS.

Working principle

The electronic beam is accelerated by an electric field and than directed by a magnetic film to the crucible, for local heating the material in evaporation.

Specifications

  • The process is performed in high vacuum, below 2×10-6 milliBar
  • The vacuum system is pumped by a cryogenic pump
  • The equipment can process in reactive atmosphere (oxygen) if required
  • The rotating dome is able to accommodate 9 150 mm wafers and it can be heated to 250 °C
  • The deposition rate is monitored by quartz crystal system
  • The revolving crucible holder allows multilayer deposition