Wet Bench Single Wafers Etching – SPM

Andrea Scaccabarozzi, Stefano Fasoli
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Wet Process


The bench is equipped with 1 Teflon tank for HF etching, 2 heated acid etch tanks, 2 dump rinse tanks and a tools cleaning tank.

Working principle

The tanks are built for single wafer etching, in order to save reagents; the acid part (HF and the other 2 heated tanks) have the local manual controlled drain setup.


Supplied with DI Water at 18 MOhm.