Clean Room Equipment
The cleanroom of Polifab provides versatile support for proof-of-concepts and acts as a fast prototyping platform for novel materials, processes and devices in the fields of photonics, electronics, microfluidics, lab-on-chip, magneto devices, MEMS, etc.
The cleanroom includes an area in ISO 6 class of 330 m2 and an area in ISO 8 class of 290 m2 equipped with facilities for:
• Optical lithography;
• Electron beam lithography;
• Wet and dry etching;
• Thin film deposition;
• Metrological characterization;
We can process several different types of substrate materials (silicon, glass, plastic, etc…) and sizes from small pieces to 8-inch wafers.
Below you can find the list of all the equipment currently in use at PoliFab.
Contact us in case of interest in our facility.