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Lithography
Lithography
RAITH
EBL System – Raith Voyager
Nanoscribe
Two-Photon 3D Printer – Nanoscribe Quantum X Shape
Heidelberg Instruments
Laser Writer – Heidelberg DWL66+
Heidelberg Instruments
Maskless Aligner – Heidelberg MLA100
Karl Süss
Mask Aligner – Karl Süss MA6/BA8
Heidelberg Instruments
NanoFrazor Explore
Sawatec
Spin Module with Hot Plate – Sawatec SM-200/HP-200duo
Sawatec
Developer Module – SAWATEC SMD-200
Karl Süss
Spin Coater – Karl Süss RC8
Sawatec
Spin Coater – Sawatec SM-150
Sawatec
Hot Plate – Sawatec HP401
PVA TePla AG
Plasma Asher – PVA TEPLA 300 AL
Zeiss
Optical Microscope – Zeiss Axio Imager.A2 Vario
Leica
Optical Microscope – Leica INM 200
PoliFAB’s Staff
UV Exposure Box – PoliFAB
SPM
Wet Bench Solvents – SPM
SPM
Wet Bench Development – SPM
Robotank
Wet Bench Lithography – Robotank
SPM
Wet Bench Lithography – SPM
Semitool
Spin Rinser Dryer – Semitool
Other areas
Lithography
Deposition
Etching
Characterization
Back End