ArPES System for Advanced Spectroscopy – Specs

The Angle-resolved PhotoEmission Spectroscopy (ArPES) system is composed of a load lock chamber, a preparation chamber and an analysis chamber. The preparation chamber is equipped with an electron beam heater for sample annealing, a sputter gun to clean sample surface with Ar bombardment, a multi-pocket electron beam deposition tool, and a combined LEED and Auger spectroscopy tool for preliminary sample analysis. The measurement chamber is equipped with a manipulator which can either heat up the sample up to 120 °C or cool it down up to liquid helium temperatures, a conventional dual XPS source (Mg k-alpha and Al k-alpha), a flood gun to measure insulating samples, a UV lamp for ArPES measurements (both He I and He II are possible) and the Astraios analyzer (best energy resolution 0.3 meV, momentum resolution <0.005 Å^-1, angular resolution <0.1°). Additional gas sources for the UV lamp will be added in the future.

• Substrates only on flag style adapters, maximum dimensions 10x10x1 mm
• Preparation chamber: annealing, sputter cleaning, e-beam deposition, LEED, Auger
• Measurement chamber: XPS (Al K-alpha or Mg k-alpha), ArPES (from He I or He II)
• Possibility to transfer directly to the Createc MBE system in vacuum