SEM with EDX – ZEISS Ultra55

Details

Manufacturer
Zeiss
Contact person
Elisa Sogne, Alessio Giampietri

Description:

The Zeiss Ultra55, equipped with GEMINI technology, features a fully integrated in‑lens detector, an Everhart–Thornley secondary electron (SE) detector, and an energy‑selective backscattered (EsB) detector. The EsB detector includes an integrated filter grid (0–1500 V) that enhances image quality and compositional sensitivity. Together with the large multi‑port analytical chamber, the fully motorized 5‑axis eucentric stage, and the high‑current mode, the system provides versatile imaging performance and outstanding analytical capabilities.

For elemental analysis, the Ultra55 is equipped with Oxford x-act 10 mm2 Silicon drift detector (SDD). GEMINI® high current mode also offers high analytical capabilities.

Working principle

The Gemini objective lens design combines electrostatic and magnetic fields to maximize optical performance while reducing field influences at the sample to a minimum. This enables excellent imaging, even on challenging samples such as magnetic materials. The Gemini in-lens detection concept ensures efficient signal detection by detecting secondary (SE) and backscattered (BSE) electrons in parallel minimizing time-to-image. Gemini beam booster technology guarantees small probe sizes and high signal to-noise ratios. A sketch of the electron gun and SEM chamber can been seen in figure.

 

Specifications

  • Electron Source: Thermal field emission gun (FEG)
  • Resolution: 1.0 nm at 15 kV, 1.7 nm at 1 kV, 4.0 nm at 0.1 kV
  • Acceleration Voltage: Variable from 20 V to 30 kV
  • High current mode
  • Detectors:  EsB®detector with filtering grid (0 – 1500V), High efficiency in-lens SE detector, Chamber mounted Everhart-Thornley detector
  • Motorized 5-axis sample stage:
    • X and Y axes: 130 mm
    • Z axis: 50 mm
    • Tilt: -1° to 70°
    • Rotation: 360° continuous
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