Spin Coater – POLOS SPIN150i

POLOS
Operative
Alessia Romeo, Lorenzo Livietti
Authorized user
Yellow Room

Description:

All NPP POLOS single wafer spin coaters are specifically designed for R&D and low volume production in the MEMS, Semiconductor, PV, Microfluidics field, etc. Suitable for all typical spin processes: cleaning, rinse/dry, coating, developing and etching. The SPIN150i spin coater is suitable for processing fragments as small as 5 mm up to Ø150 (or 6”) or 4″ x 4″ substrates. Detachable touchpanel. Unlimited Program Storage for recipes with multiple steps each (CW & CCW rotation for puddle spin coating applications.)

Specifications

  • Unlimited Program Storage for recipes with multiple steps
  • Wafer size up to 6 inches
  • Rotation speed: 0-12000 rpm
  • Acceleration /Deceleration 1-30,000 rpm/sec, selectable per step
  • Time 0.1-99999 sec/step
  • Rotation direction (CW, CCW, puddling)