Wet Bench Development – SPM
Details
Manufacturer
SPM
Website
Contact person
Andrea Scaccabarozzi, Gianluca Cannetti
Location
Description:
The bench is equipped with a heated process tank and a rinse-up tank, 2 DI-H2O and 2 N2 spray guns.
The front console is equipped with 4 power outlets and 2 vacuum connections.
Working principle
This wet bench is designed for development processes in lithography.
Specifications
Supplied with DI Water at 18 MOhm.
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