Manufacturer
SPM
Contact person
Chiara Nava, Andrea Scaccabarozzi
Location
Description:
The bench is equipped with one rinse tank, one heated process tank (not in use), one N2 and one DI-H2O spray guns.
Working principle
This bench is used for development of substrates in lithography processes.
Specifications
Supplied with DI Water at 18 MOhm
