Wet Bench Single Wafers Etching – SPM

SPM
Operative
Lorenzo Livietti, Alessia Romeo
Loading: Authorized user, Drain of reagents: Only authorized POLIFAB personal
Wet Process

Description:

The bench is equipped with 1 Teflon tank for HF etching, 2 heated acid etch tanks, 2 dump rinse tanks and a tools cleaning tank.

Working principle

The tanks are built for single wafer etching, in order to save reagents; the acid part (HF and the other 2 heated tanks) have the local manual controlled drain setup.

Specifications

Supplied with DI Water at 18 MOhm.