RIE ICP – Oxford Plasmalab 100
Oxford Instruments
The bench is equipped with 2 heated-closed loop drain chemical tanks for Solvents and KOH, 1 Teflon tank for HF etching, 2 heated acid etch tanks and 2 dump rinse tanks.
The solvents side of the bench has manually operated drain, the acid part (HF and the other 2 heated tanks) has the automatic controlled drain setup.
Supplied with DI Water at 18 MOhm.