RIE ICP – Oxford Plasmalab 100
Oxford Instruments
The Plasma-System 300 semiauto is used mainly in the semiconductor and microelectronics industry for dry removal of organic layers, especially:
The Plasma-System 300 semiauto is a Microwave Plasma Batch Asher. The plasma excitation is performed by means of 1000 Watt microwave power supply.
The substrates are processed at a pressure of 0,6 – 1,5 mbar. The generated chemical radicals react with the substrate surfaces and create volatile products which are extracted by the vacuum pump. The most widely used gasses are oxygen. Often mixtures of different gases are used to get selective etching processes or manipulate etching rate.