PLD System – Neocera

The pulsed laser deposition (PLD) setup is composed of a Coherent excimer laser and two Neocera vacuum chambers (loadlock and deposition chamber). The 248 nm class 4 laser allows a maximum repetition frequency up to 100 Hz. The vacuum chambers can host up to three 2” targets, or up to six 1” targets, and allows to grow oxide materials either on small samples (10×10 mm) or up to 4” wafers. The uniformity over 4” wafers is guaranteed by the “beam scan” mode, which moves the position of the laser on the target. In principle it is possible to grow any oxide material if the user provides a suitable target, but a discussion with PoliFab staff members is needed to confirm suitability (some material could contaminate the deposition chamber).

•  Substrate temperature up to 800°C (radiated heater up to 1050°C)
• Possible substrate size: 4” wafer, 2” wafer, 10×10 mm
• Targets
  currently available (2”): SrTiO₃ (STO), ZrO₂/Y₂O₃
  (YSZ), YBa₂Cu₃O₇
• Targets provided by users can be inserted after discussion with PoliFab staff
• 10×10 mm samples are compatible with the transfer to a Vacuum Suitcase