Sputtering cluster – Polyteknik Flextura 200
Details
Manufacturer
Polyteknik AS
Contact person
Marco Asa, Miriam Saleh
Location
Description
The Flextura cluster, features 3 deposition chamber allowing complex multilayer, reactive processes, and co-sputtering.
- Oxide sputtering: Confocal module with 4 cathodes for processing oxides and nitrides in both RF and DC/pulsed DC. Substrate heating up to 800°C
- Metal sputtering: Confocal module with 4 cathodes for processing metals and nitrides in DC/pulsed DC. Substrate heating up to 500°C
- Remote plasma sputtering: 4 targets available for processing in DC/pulsed DC. Substrate heating up to 800°C, Susbstrate biasing, optical plasma monitoring.
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