Wet Bench Multi Wafers Etching – SPM

SPM
Operative
Lorenzo Livietti, Alessia Romeo
Loading: Authorized user, Drain of reagents: Only authorized POLIFAB personal
Wet Process

Description:

The bench is equipped with 2 heated-closed loop drain chemical tanks for Solvents and KOH, 1 Teflon tank for HF etching, 2 heated acid etch tanks and 2 dump rinse tanks.

Working principle

The solvents side of the bench has manually operated drain, the acid part (HF and the other 2 heated tanks) has the automatic controlled drain setup.

Specifications

Supplied with DI Water at 18 MOhm.